Prof. Yu Lei: Single Atom Catalysts by Atomic Layer Deposition

Single-atom heterogeneous catalysts (SACs) show promising performance in various chemical reactions due to their unique electronic and geometric structures. This presentation highlights the development of thermally stable SACs using atomic layer deposition (ALD). In the first example, isolated Pd1 catalysts protected by ALD TiO2 films were confirmed by STEM, XAS, and DRIFTS. The catalyst's thermal stability varied with ALD film thickness, oxide type, and promoters. In situ, Pd XANES revealed surface coverage of CO on the Pd surface. The second example involves Pt3Zn1 and Pt1Zn1 intermetallic nanoparticles synthesized on SiO2 support, combining ALD and incipient wetness impregnation. Due to combined electronic and geometric effects, these intermetallic phases were thermodynamically stable and exhibited high reactivity in the ethane-to-ethylene reaction. This presentation highlights the potential of ALD in creating stable and high performing catalysts by precisely tuning their structure and composition.

Yu Lei is an associate professor and chair of the Department of Chemical and Materials Engineering at the University of Alabama in Huntsville. He received a B.S. from Nanjing University in 2004, a Ph.D. in Chemical Engineering from the University of Illinois at Chicago in 2010, and postdoctoral training at Argonne National Laboratory. He leads a dynamic research group on advancing atomic layer deposition (ALD) technology, developing cutting-edge techniques and processes applicable to catalysis, batteries, optics, and electronics. He has published 64 peer-reviewed articles and three patents,resulting in over 4900 citations and an H-index of 31. He received the Powe Junior Faculty Award from the Oak Ridge Associated Universities and the PRF New Doctoral Investigator Award from the American Chemical Society in 2015. His  dedication to academic excellence led to his selection as a Fulbright Scholar by the US Department of State in 2024.